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Chemical Vapour Deposition of Permeation Enhancement Films

Release time:2023-12-15 13:41

Classification: Industry dynamics

Chemical Vapour Deposition (CVD) of Transmission Enhancement Films

Chemical Vapour Deposition (CVD) (Transmission Enhancement Film) is to supply gases containing the elements that make up the film to the substrate, and use energy sources such as heating, plasma and ultraviolet light to deposit the film on the substrate in a chemical reaction, which allows for the preparation of reflection-reducing films for solar cells, such as SiN, ZnS, SiO2, SiC, and so on.

The CVD method has many advantages: small directionality of film formation, good microscopic uniformity; high film purity, low residual stress, strong ductility; the film is subject to less radiation damage.

The main disadvantages of CVD are the need to react at high temperatures, high substrate temperatures, low deposition rates, generally only a few microns to a few hundred microns per hour, the complexity of the equipment used, the difficulty of localised deposition of the substrate, and the toxicity of the reaction source and the residual gases after the reaction, etc. CVD is often classified according to the type of reaction or the pressure, and the following are commonly used: low-pressure CVD (LPCVD) [20], The following types of CVD are commonly used: low pressure CVD (LPCVD) [20], atmospheric pressure CVD (APCVD), subatmospheric pressure CVD (SACVD), ultra-high vacuum CVD (UHCVD) (with permeation enhancement membranes), plasma-enhanced CVD (PECVD), high-density plasma CVD (HDPCVD), and rapid thermal CVD (RTCVD).

Plasma Enhanced Chemical Vapour Deposition (PECVD) is the most widely used method for industrial deposition of many materials.  

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